Figure 12 from Air spacer for 10nm FinFET CMOS and beyond

Spacer FinFET: nanoscale double-gate CMOS technology for the terabit era - ScienceDirect

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Impact of MOL/BEOL Air-Spacer on Parasitic Capacitance and Circuit

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PDF) FinFET scaling to 10 nm gate length

Spacer FinFET: nanoscale double-gate CMOS technology for the terabit era - ScienceDirect

What's Next For Transistors And Chiplets

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10 nm FinFET device demonstration of a 12 % reduction of effective

Short-channel effect comparison of InSe FETs and silicon FinFETs a